Prof. Prof Ki-Bum Kim
The major research area of Prof. Kim is to investigate the structure and property relationship in thin film materials. In particular, he is actively working on the development of metallization processes for the next generation Integrated Circuits (ICs) including the development of silicides (titanium silicide and cobalt silicide), diffusion barriers (titanium nitrides and tantalum nitrides), and interconnect (aluminum and copper) materials and processes. He is also working on other applications of thin films such as polycrystalline Si thin film transistor, electrode for the dielectrics, and diamond field electron emitters.